Electron-beam deposition of vanadium dioxide thin films

Academic Article

Abstract

  • Developing a reliable and efficient fabrication method for phase-transition thin-film technology is critical for electronic and photonic applications. We demonstrate a novel method for fabricating polycrystalline, switchable vanadium dioxide thin films on glass and silicon substrates and show that the optical switching contrast is not strongly affected by post-processing annealing times. The method relies on electron-beam evaporation of a nominally stoichiometric powder, followed by fast annealing. As a result of the short annealing procedure we demonstrate that films deposited on silicon substrates appear to be smoother, in comparison to pulsed laser deposition and sputtering. However, optical performance of e-beam evaporated film on silicon is affected by annealing time, in contrast to glass. © 2012 Springer-Verlag Berlin Heidelberg.
  • Digital Object Identifier (doi)

    Author List

  • Marvel RE; Appavoo K; Choi BK; Nag J; Haglund RF
  • Start Page

  • 975
  • End Page

  • 981
  • Volume

  • 111
  • Issue

  • 3