Electron polarization, and photoluminescence of sputtered AIN:Sm thin films for optoelectronics and photonics applications

Academic Article


  • Thin films of aluminum nitride (AIN) doped with samarium (Sm) are deposited on silicon (100) substrates at 77 K by rf magnetron sputtering method. 200-400 nm thick films are grown at 100-200 watts RF power and 5-8 mTorr nitrogen, using a metal target of Al with Sm. Photoluminescence is performed using a 488 nm laser beam and two peaks are observed in Sm at 598 nm and 707 nm as a result of G → H , and G → H transitions. Polarization studies are performed using an σ+ polarized laser. Both σ+ and σ- polarization exists. However a- polarization is dominant, showing that spin up electrons are the majority charge carriers. The existence of a+ and a- polarization at the same time further reveals that light holes and heavy holes are taking part together in every transition. Copyright © 2010 American Scientific Publishers All rights reserved. 4 6 4 6 5/2 7/2 5/2 11/2
  • Digital Object Identifier (doi)

    Author List

  • Hopkins D; Maqbool M
  • Start Page

  • 64
  • End Page

  • 67
  • Volume

  • 5
  • Issue

  • 1