Reported here is the continuation of the structure characterization of carbon thin films produced by a pulsed vacuum arc plasma source. Hydrogen free carbon films with thickness up to 3 μm were prepared with average deposition rate of 5 μm/h onto various substrates. It was found that these carbon films are not quite amorphous and can be described by modelling the clustered structure with different sp3/sp2/sp bond ratios depending on deposition conditions. Results of the experimental investigations and numerical modelling of the films structure are presented. © 1995.