Structure modelling of DLC-films formed by pulsed arc method

Academic Article

Abstract

  • Reported here is the continuation of the structure characterization of carbon thin films produced by a pulsed vacuum arc plasma source. Hydrogen free carbon films with thickness up to 3 μm were prepared with average deposition rate of 5 μm/h onto various substrates. It was found that these carbon films are not quite amorphous and can be described by modelling the clustered structure with different sp3/sp2/sp bond ratios depending on deposition conditions. Results of the experimental investigations and numerical modelling of the films structure are presented. © 1995.
  • Digital Object Identifier (doi)

    Author List

  • Tochitsky EI; Stanishevsky AV
  • Start Page

  • 399
  • End Page

  • 401
  • Volume

  • 21
  • Issue

  • 6