Benchmarking stencil reticles for electron projection lithography

Academic Article

Abstract

  • The electron projection lithography (EPL) stencil mask making process was investigated. A number of EPL test reticles were fabricated, imaging them in Nikon's experimental projection electron-beam column in an effort to benchmark them. Extensive measurements of image placement (IP) accuracy and critical dimension (CD) uniformity were made on the resulting images. The EPL stencil reticle repair techniques and stencil mask stability following prolonged electron beam irradiation were also discussed. The current status of the data handling software needed to pattern an EPL stencil reticle was also presented.
  • Author List

  • Wood OR; Trybula WJ; Lercel MJ; Thiel CW; Lawliss MJ; Edinger K; Stanishevsky A; Shimizu S; Kawata S
  • Start Page

  • 3072
  • End Page

  • 3077
  • Volume

  • 21
  • Issue

  • 6